The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2007
Filed:
Nov. 21, 2005
Santiago E. Del Puerto, Milton, NY (US);
Michael A. Demarco, Victor, NY (US);
Glenn M. Friedman, Redding, CT (US);
Jorge S. Ivaldi, Trumbull, CT (US);
James A. Mcclay, Oxford, CT (US);
Santiago E. del Puerto, Milton, NY (US);
Michael A. DeMarco, Victor, NY (US);
Glenn M. Friedman, Redding, CT (US);
Jorge S. Ivaldi, Trumbull, CT (US);
James A. McClay, Oxford, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include a base portion and top portion, and can include a seal. Each cassette has at least one vent and at least one filter. The system further includes a box having a base and lid. The box holds one or more cassette-substrate arrangements. A storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. The entry-exit module can include a shuttle and/or elevator for transporting the cassette-substrate arrangement. During transitioning, the filter(s) and vent(s) restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.