Suwon-si, South Korea

Joon-Hwa Bae

USPTO Granted Patents = 17 

 

Average Co-Inventor Count = 6.5

ph-index = 2

Forward Citations = 5(Granted Patents)


Location History:

  • Yongin-si, KR (2019 - 2021)
  • Suwon-si, KR (2017 - 2024)

Company Filing History:


Years Active: 2017-2025

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17 patents (USPTO):

Title: The Innovative Contributions of Joon-Hwa Bae

Introduction

Joon-Hwa Bae is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of substrate polishing technology, holding a total of 17 patents. His work has been instrumental in advancing the manufacturing processes for display devices.

Latest Patents

Among his latest patents is a substrate polishing apparatus designed to enhance the efficiency of substrate processing. This apparatus features a stage with a flat surface for loading substrates, a pressing unit that applies pressure in a specific direction, and a rotary unit that revolves the pressing unit around a central axis. Additionally, it includes multiple polishing pads that contact the substrate and a nozzle part for supplying polishing slurry. Another notable patent involves a polishing slurry that contains various components, including polishing particles and a dispersing agent, aimed at improving the manufacturing of display devices.

Career Highlights

Joon-Hwa Bae has worked with leading companies in the industry, including Samsung Display Co., Ltd. and Ubmaterials Inc. His experience in these organizations has allowed him to develop innovative solutions that address the challenges in substrate polishing and display device manufacturing.

Collaborations

Throughout his career, Joon-Hwa Bae has collaborated with notable colleagues such as Byoung Kwon Choo and Woo Jin Cho. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Joon-Hwa Bae's contributions to substrate polishing technology and display device manufacturing have established him as a key figure in the field. His innovative patents and collaborations reflect his commitment to advancing technology in this area.

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