Fremont, CA, United States of America

John Edward Daugherty

This inventor holds 76 USPTO granted patents and 26 published patent applications and 6 EPO patents, primarily in Semiconductor Processing (CPC class H01L). Top assignee: Lam Research Corporation. Active years: 1983-2026.

USPTO Granted Patents = 76 

% Patents Active = 90.8

 

Average Co-Inventor Count = 3.9

ph-index = 16

Forward Citations = 684(Granted Patents)

Forward Citations (Not Self Cited) = 648(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Washington, DC (US) (1983)
  • Oakland, CA (US) (2000 - 2002)
  • Alamada, CA (US) (2004)
  • Newark, CA (US) (2004 - 2012)
  • Alameda, CA (US) (2003 - 2013)
  • Fremont, CA (US) (2004 - 2024)

Company Filing History:


Years Active: 1983-2026

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Areas of Expertise:
Plasma Chamber
Wafer Transport
Cleaning Techniques
Gas Distribution
Machine Learning
Conditioning Components
Aerosol Deposition
Corrosion Resistance
MEMS Flow Controller
Electrode Design
Surface Patterning
Vacuum Pump Protection
76 patents (USPTO):Explore Patents

Title: Innovator Spotlight: John Edward Daugherty

Introduction: John Edward Daugherty is a renowned inventor based in Fremont, California. With an impressive portfolio of 75 patents, Daugherty has made significant contributions to the fields of technology and engineering, particularly through his work at Lam Research Corporation.

Latest Patents: Daugherty's recent patents highlight his innovative approach to solving complex problems. One notable invention is the "Method and apparatus for measuring particles," which provides an apparatus for measuring contamination on a critical surface of a part. This design incorporates a vessel for mounting the part, an inert gas source in fluid connection with the vessel, and at least one diffuser to expose the critical surface to the inert gas. Additionally, his patent on the "Single crystal metal oxide plasma chamber component" focuses on a component of a plasma processing chamber that features single crystal metal oxide material, designed to enhance the efficiency and effectiveness of plasma processing.

Career Highlights: Throughout his career, John Edward Daugherty has been committed to advancing technological innovations. His role at Lam Research Corporation has allowed him to work on cutting-edge projects, driving significant advancements in the semiconductor industry.

Collaborations: Daugherty has collaborated with notable colleagues, including Hong Shih and Robert J. O'Donnell, contributing to a team that values innovation and excellence in research and development.

Conclusion: John Edward Daugherty stands out as a key figure in the innovation landscape, with a robust portfolio of patents that exemplify his dedication to improving technology. His work not only contributes to Lam Research Corporation but also significantly impacts the broader field of engineering and technology.

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