The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2025
Filed:
Oct. 21, 2020
Lam Research Corporation, Fremont, CA (US);
Lin Xu, Fremont, CA (US);
Douglas Detert, Fremont, CA (US);
John Daugherty, Fremont, CA (US);
Pankaj Hazarika, Fremont, CA (US);
Satish Srinivasan, Fremont, CA (US);
Nash W. Anderson, Fremont, CA (US);
John Michael Kerns, Fremont, CA (US);
Robin Koshy, Fremont, CA (US);
David Joseph Wetzel, Fremont, CA (US);
Lei Liu, Fremont, CA (US);
Eric A. Pape, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A component of a plasma processing chamber having at least one plasma facing surface of the component comprises single crystal metal oxide material. The component can be machined from a single crystal metal oxide ingot. Suitable single crystal metal oxides include spinel, yttrium oxide, and yttrium aluminum garnet (YAG). A single crystal metal oxide can be machined to form a gas injector of a plasma processing chamber.