The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2024

Filed:

Mar. 24, 2021
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Amir A. Yasseri, San Jose, CA (US);

Hong Shih, Santa Clara, CA (US);

John Daugherty, Fremont, CA (US);

Duane Outka, Fremont, CA (US);

Lin Xu, Fremont, CA (US);

Armen Avoyan, Glendale, CA (US);

Cliff La Croix, Gardnerville, NV (US);

Girish Hundi, Dublin, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/04 (2006.01); B08B 3/04 (2006.01); B08B 3/12 (2006.01); B08B 3/14 (2006.01); B08B 5/02 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
B08B 7/04 (2013.01); B08B 3/048 (2013.01); B08B 3/12 (2013.01); B08B 3/14 (2013.01); B08B 5/02 (2013.01); H01J 37/32853 (2013.01);
Abstract

A method for conditioning a component of a wafer processing chamber is provided. The component is placed in an ultrasonic conditioning solution in an ultrasonic solution tank. Ultrasonic energy is applied through the ultrasonic conditioning solution to the component to clean the component. The component is submerged in a megasonic conditioning solution in a tank. Megasonic energy is applied through the megasonic conditioning solution to the component to clean the component.


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