The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2021
Filed:
Jan. 30, 2018
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Amir A. Yasseri, San Jose, CA (US);
Duane Outka, Fremont, CA (US);
Hong Shih, Santa Clara, CA (US);
John Daugherty, Fremont, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/32 (2006.01); C09D 5/00 (2006.01); C09D 1/00 (2006.01); C01G 25/02 (2006.01); C23C 4/02 (2006.01); C23C 4/12 (2016.01); C23C 4/01 (2016.01); C01F 7/02 (2006.01); C23C 4/18 (2006.01); C23C 4/10 (2016.01); C23C 4/11 (2016.01);
U.S. Cl.
CPC ...
C09D 5/008 (2013.01); B05D 1/32 (2013.01); C01F 7/02 (2013.01); C01G 25/02 (2013.01); C09D 1/00 (2013.01); C23C 4/01 (2016.01); C23C 4/02 (2013.01); C23C 4/10 (2013.01); C23C 4/11 (2016.01); C23C 4/12 (2013.01); C23C 4/18 (2013.01);
Abstract
A method for providing a part with a plasma resistant ceramic coating for use in a plasma processing chamber is provided. A patterned mask is placed on the part. A film is deposited over the part. The patterned mask is removed. A plasma resistant ceramic coating is applied on the part.