Jiakun Wang

Title: Jiakun Wang: Innovator in Semiconductor Technology

Introduction

Jiakun Wang is a prominent inventor based in Hangzhou, China, known for his significant contributions to semiconductor technology. With a total of seven patents to his name, Wang has made remarkable advancements in the field, particularly in the development of silicon carbide devices.

Latest Patents

Wang's latest patents include a silicon carbide MOSFET device and its manufacturing method. This innovative method involves forming a patterned first barrier layer on the substrate's upper surface and creating a base region through oblique implantation. The process not only reduces the need for an additional photoetching step, thereby saving costs, but also enhances device performance by achieving a shorter channel and lower on-resistance. Another notable patent is for a LDMOS transistor and its manufacturing method, which includes forming an epitaxial layer and a gate structure, ultimately connecting the source region with the substrate.

Career Highlights

Jiakun Wang is currently employed at Hangzhou Silicon-Magic Semiconductor Technology Co., Ltd., where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor devices.

Collaborations

Wang collaborates with talented individuals in his field, including Bing Wu and Hui Chen, who contribute to the innovative environment at their company.

Conclusion

Jiakun Wang's contributions to semiconductor technology through his patents and work at Hangzhou Silicon-Magic Semiconductor Technology Co., Ltd. highlight his role as a leading inventor in the industry. His innovative methods are paving the way for future advancements in semiconductor devices.