Kaohsiung, Taiwan

Jia-Rui Lee


Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2017-2025

where 'Filed Patents' based on already Granted Patents

10 patents (USPTO):

Title: Innovator Jia-Rui Lee: Pioneering Advances in Semiconductor Technology

Introduction: Jia-Rui Lee, an accomplished inventor based in Kaohsiung, Taiwan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 10 patents, he has positioned himself as a thought leader in the industry. His innovative approaches continue to impact the performance and efficiency of semiconductor devices.

Latest Patents: Among his latest patents, Jia-Rui Lee has developed a unique semiconductor structure and associated fabricating method. This process includes the formation of an isolation trench within a substrate, creating a trench fill layer that effectively fills this trench. Additionally, it involves exposing a sidewall of the isolation trench while ensuring that the bottom remains covered. A gate structure is then formed over the substrate, making contact with the trench's sidewall, showcasing Lee's expertise in intricate semiconductor design.

Another significant innovation from Lee is the dual gate structures for semiconductor devices. This patent describes a semiconductor structure featuring a channel region, alongside source and drain regions. The dual gate structure includes distinct configurations over both the channel and drift regions, demonstrating Lee's commitment to enhancing semiconductor functionality through advanced design methodologies.

Career Highlights: Jia-Rui Lee has built his career with impressive stints at prominent companies such as Taiwan Semiconductor Manufacturing Company Ltd. and Parabellum Strategic Opportunities Fund LLC. His experience in these organizations has provided him with a robust foundation in semiconductor research and development.

Collaborations: Throughout his career, Lee has collaborated with notable colleagues, including Kuo-Ming Wu and Yi-Chun Lin. These working relationships have fostered a collaborative environment that encourages innovative thinking and exploration in semiconductor technology.

Conclusion: Jia-Rui Lee's contributions to the semiconductor industry are noteworthy, with a focus on cutting-edge fabrication methods and dual gate structures that enhance device performance. His ongoing innovations reflect a deep commitment to advancing technology, solidifying his reputation as a pivotal figure in the field of semiconductors.

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