Company Filing History:
Years Active: 2019-2022
Title: **Innovator Spotlight: Ji-Min Lin**
Introduction
Ji-Min Lin, hailing from Taichung, Taiwan, is a distinguished inventor known for his contributions to the semiconductor industry. With a total of six patents to his name, Lin has made significant strides in the field of transistor fabrication.
Latest Patents
Two of his latest patents showcase innovative methods in semiconductor technology. The first patent details a **fabricating method of transistors without dishing occurring during the CMP process**. This method introduces a substrate containing numerous transistors, each equipped with a gate structure. A critical aspect of this invention is the use of buffering particles that are strategically positioned to prevent contact with one another, facilitating a more efficient planarization process.
The second patent is focused on a **semiconductor device and method for fabricating the same**. This invention outlines a complex structure involving layers of silicon, titanium nitride, and conductive materials like titanium silicide. The design enhances the performance and reliability of semiconductor devices, showcasing Lin's deep understanding of material science and engineering.
Career Highlights
Throughout his career, Ji-Min Lin has been associated with several prominent companies in the semiconductor sector. Notably, he has worked with **United Microelectronics Corporation** and **Fujian Jinhua Integrated Circuit Co., Ltd.**, where he applied his expertise in transistor design and fabrication.
Collaborations
Lin has had the opportunity to collaborate with talented professionals in the industry, including his esteemed coworkers Yu-Lung Shih and Kun-Ju Li. These collaborations have likely contributed to the innovative outcomes evident in his patents.
Conclusion
Ji-Min Lin's contributions to the field of semiconductor technology through his inventive patents and collaborative efforts reflect his commitment to advancing innovation. His work stands as a testament to the importance of creativity and expertise in the development of cutting-edge technology.