Company Filing History:
13 out of 13,726 
2 out of 15,513 
Years Active: 2016-2020
Title: **Jessica Sevanne Kachian: A Trailblazer in Chemical Vapor Deposition Innovations**
Introduction
Jessica Sevanne Kachian is an innovative inventor based in Sunnyvale, California. She has made significant contributions to the field of chemical vapor deposition, holding a remarkable total of 13 patents. Her research and developments are crucial in advancing semiconductor technology, particularly in the formation of silicon layers and gate oxides.
Latest Patents
Among her latest patents are groundbreaking methods for self-limiting and saturating chemical vapor deposition of a silicon bilayer. This process uniquely does not require plasma or catalysts and prevents undesired substrate oxidation, producing a saturated silicon film with -OH termination. This termination enhances the reactivity of substrate surfaces towards metal Atomic Layer Deposition (ALD) precursors, facilitating superior nucleation and growth of gate oxide ALD materials.
Another notable patent involves methods for depositing silicon that include cycling doses of chlorosilane precursors to create multiple layers on III-V surfaces. These methods encompass treatments that enhance the silicon layers through atomic hydrogen, leading to a sophisticated layered composition vital for high-performance semiconductor applications.
Career Highlights
Kachian's expertise has been honed through her tenure with esteemed organizations such as Applied Materials, Inc. and the University of California. Her work has positioned her at the forefront of technological advancements in the semiconductor sector.
Collaborations
Throughout her career, Jessica has collaborated with notable professionals in her field, including Jeffrey W. Anthis and Andrew C. Kummel. These partnerships have facilitated the integration of diverse insights and expertise, enabling continued innovation in her projects.
Conclusion
Jessica Sevanne Kachian exemplifies the spirit of innovation through her substantial contributions to the field of semiconductor technology. Her patents reflect a commitment to enhancing chemical vapor deposition methods, leading to significant improvements in device performance and reliability. As her career progresses, her work will undoubtedly continue to shape the future of this critical industry.