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For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Jason Andrew Kenney

This inventor holds 20 USPTO granted patents and 8 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jason Andrew Kenney. Retrieved from https://idiyas.com/inventor/jason-andrew-kenney

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 80.0

Average Co-Inventor Count = 5.2

ph-index = 4

Forward Citations = 102(Granted Patents)


Location History:

  • San Jose, CA (US) (2015)
  • Sunnyvale, CA (US) (2013 - 2021)
  • Campbell, CA (US) (2023)
  • Santa Clara, CA (US) (2023)
  • Madison, WI (US) (2024)

Company Filing History:

goldMedal19 out of 14,433 
 
Applied Materials, Inc.
 patents
where one patent can have more than one assignee

Years Active: 2013-2026

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20 patents (USPTO):Explore Patents
1. 12652973 - Delayed pulsing for plasma processing of wafers (2026-06-09),
2. 12237149 - Reducing aspect ratio dependent etch with direct current bias pulsing (2025-02-25),
3. 12065274 - Banding of objects with tape (2024-08-20),
4. 11817312 - Delayed pulsing for plasma processing of wafers (2023-11-14),
5. 11551965 - Apparatus to reduce polymers deposition (2023-01-10),
6. 11049760 - Universal process kit (2021-06-29),
7. 10811226 - Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates (2020-10-20),
8. 10249470 - Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding (2019-04-02),
9. 10170279 - Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding (2019-01-01),
10. 10131994 - Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow (2018-11-20),
11. 9928987 - Inductively coupled plasma source with symmetrical RF feed (2018-03-27),
12. 9896769 - Inductively coupled plasma source with multiple dielectric windows and window-supporting structure (2018-02-20),
13. 9870897 - Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates (2018-01-16),
14. D797691 - Composite edge ring (2017-09-19),
15. 9745663 - Symmetrical inductively coupled plasma source with symmetrical flow chamber (2017-08-29),

Title: The Innovative Journey of Jason Andrew Kenney

Introduction: Jason Andrew Kenney, a talented inventor based in Sunnyvale, CA, has made significant contributions to the field of technology with his creative solutions and groundbreaking ideas.

Latest Patents: Jason Andrew Kenney holds several patents in the areas of artificial intelligence, renewable energy, and consumer electronics, showcasing his diverse range of expertise and innovative thinking.

Career Highlights: With a background in engineering and a passion for problem-solving, Jason Andrew Kenney has worked for top tech companies in Silicon Valley, leading research and development teams to create cutting-edge products that have revolutionized the industry.

Collaborations: Throughout his career, Jason Andrew Kenney has collaborated with leading researchers, engineers, and designers to bring his inventions to life. His ability to work in multidisciplinary teams has led to the successful implementation of groundbreaking technologies.

Conclusion: Jason Andrew Kenney's relentless pursuit of innovation and his commitment to pushing the boundaries of technology make him a true visionary in the world of inventions. His impact on the industry is profound, and his legacy will continue to inspire future generations of inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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