The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
Nov. 01, 2012
Applied Materials, Inc., Santa Clara, CA (US);
Andrew Nguyen, San Jose, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Shahid Rauf, Pleasanton, CA (US);
James D. Carducci, Sunnyvale, CA (US);
Douglas A. Buchberger, Jr., Livermore, CA (US);
Ankur Agarwal, Fremont, CA (US);
Jason A. Kenney, Sunnyvale, CA (US);
Leonid Dorf, San Jose, CA (US);
Ajit Balakrishna, Sunnyvale, CA (US);
Richard Fovell, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A plasma reactor for processing a workpiece includes a reactor chamber having a ceiling and a sidewall and a workpiece support facing the ceiling and defining a processing region, and a pair of concentric independently excited RF coil antennas overlying the ceiling and a side RF coil concentric with the side wall and facing the side wall below the ceiling, and being excited independently.