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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9896769 B1

PDFFull Text
Date of Patent:
Feb. 20, 2018

Filed:

Nov. 01, 2012

Inductively coupled plasma source with multiple dielectric windows and window-supporting structure

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Andrew Nguyen, San Jose, CA (US);

Kenneth S. Collins, San Jose, CA (US);

Kartik Ramaswamy, San Jose, CA (US);

Shahid Rauf, Pleasanton, CA (US);

James D. Carducci, Sunnyvale, CA (US);

Douglas A. Buchberger, Jr., Livermore, CA (US);

Ankur Agarwal, Fremont, CA (US);

Jason A. Kenney, Sunnyvale, CA (US);

Leonid Dorf, San Jose, CA (US);

Ajit Balakrishna, Sunnyvale, CA (US);

Richard Fovell, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:

Fish & Richardson P.C.

Primary Examiner:

Luz Alejandro Mulero

Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/306 (2006.01); C23F 1/08 (2006.01); C23C 14/28 (2006.01); H05H 1/46 (2006.01); B01J 12/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23F 1/08 (2013.01); B01J 12/002 (2013.01); C23C 14/28 (2013.01); H01J 37/3211 (2013.01); H01J 37/32733 (2013.01); H01J 37/32834 (2013.01); H05H 1/46 (2013.01);
Abstract

A plasma reactor enclosure has a metallic portion and a dielectric portion of plural dielectric windows supported on the metallic portion, each of the dielectric windows extending around an axis of symmetry. Plural concentric coil antennas are disposed on an external side of the enclosure, respective ones of the coil antennas facing respective ones of the dielectric windows.

Find Patent Forward Citations

Nguyen, Andrew. (2018). Inductively coupled plasma source with multiple dielectric windows and window-supporting structure (U.S. Patent No. 9896769). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9896769

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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