The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2020
Filed:
Jan. 10, 2018
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
James D. Carducci, Sunnyvale, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Richard Fovell, San Jose, CA (US);
Jason A. Kenney, Sunnyvale, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/326 (2006.01); H01J 37/32 (2006.01); H05H 1/46 (2006.01); C23C 16/505 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3211 (2013.01); C23C 16/505 (2013.01); H01J 37/321 (2013.01); H01J 37/32119 (2013.01); H01J 37/32183 (2013.01); H05H 1/46 (2013.01); H05H 2001/4667 (2013.01);
Abstract
A plasma reactor has an overhead inductively coupled plasma source with two coil antennas and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.