logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9745663 B1

PDFFull Text
Expired
Date of Patent:
Aug. 29, 2017

Filed:

Nov. 01, 2012

Symmetrical inductively coupled plasma source with symmetrical flow chamber

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Andrew Nguyen, San Jose, CA (US);

Kenneth S. Collins, San Jose, CA (US);

Kartik Ramaswamy, San Jose, CA (US);

Shahid Rauf, Pleasanton, CA (US);

James D. Carducci, Sunnyvale, CA (US);

Douglas A. Buchberger, Jr., Livermore, CA (US);

Ankur Agarwal, Fremont, CA (US);

Jason A. Kenney, Sunnyvale, CA (US);

Leonid Dorf, San Jose, CA (US);

Ajit Balakrishna, Sunnyvale, CA (US);

Richard Fovell, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:

Fish & Richardson P.C.

Primary Examiner:

Luz Alejandro Mulero

Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 16/00 (2006.01); C23F 1/08 (2006.01); C23C 14/28 (2006.01); H05H 1/46 (2006.01); B01J 12/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23F 1/08 (2013.01); B01J 12/002 (2013.01); C23C 14/28 (2013.01); H01J 37/3211 (2013.01); H01J 37/32733 (2013.01); H01J 37/32834 (2013.01); H05H 1/46 (2013.01);
Abstract

A plasma reactor has an overhead multiple coil inductive plasma source with symmetric RF feeds and a symmetrical chamber exhaust with plural struts through the exhaust region providing access to a confined workpiece support. A grid may be included for masking spatial effects of the struts from the processing region.

Find Patent Forward Citations

Nguyen, Andrew. (2017). Symmetrical inductively coupled plasma source with symmetrical flow chamber (U.S. Patent No. 9745663). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9745663

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…