Bronx, NY, United States of America

James Patrick Doyle

USPTO Granted Patents = 39 

Average Co-Inventor Count = 6.7

ph-index = 9

Forward Citations = 382(Granted Patents)


Location History:

  • Wis Dells, WI (US) (1989)
  • Bronx, NY (US) (1992 - 2012)
  • Armonk, NY (US) (2019)

Company Filing History:


Years Active: 1989-2019

where 'Filed Patents' based on already Granted Patents

39 patents (USPTO):

Title: **James Patrick Doyle: Innovator in Microcircuit Technology**

Introduction

James Patrick Doyle, based in the Bronx, New York, is a distinguished inventor with a remarkable portfolio of 38 patents. His work primarily revolves around innovations in microcircuit technology, showcasing his expertise and contribution to advancements in the field.

Latest Patents

Among his latest inventions, Doyle has developed a process for "Enhanced via fill material and processing for dual damascene integration." This patent outlines a method that involves insulating a porous low k substrate with an organic polymer coating, which helps mitigate capacitance increases by preventing the polymer from penetrating the substrate's pores. Additionally, his invention boasts porous microcircuit substrate materials with specific surface and subsurface pore characteristics, with the organic polymer having a substantial molecular weight and a high glass transition temperature.

Another notable patent is the "Negative thermal expansion system (NTES) device for TCE compensation in elastomer composites and conductive elastomer interconnects in microelectronic packaging." This complex method describes the process of fabricating a NTES device, utilizing a series of solutions to electrolessly deposit materials onto a patterned disk sheet, ultimately allowing for efficient thermal expansion compensation in microelectronics.

Career Highlights

James Patrick Doyle is currently associated with the International Business Machines Corporation (IBM), where he applies his extensive knowledge to drive forward innovation. His role at IBM encompasses not only the development of groundbreaking technologies but also the collaboration with a team of talented individuals to enhance product offerings in microelectronics.

Collaborations

Throughout his career, Doyle has worked closely with esteemed colleagues such as Praveen Chaudhari and James Andrew Lacey. Together, they have fostered an environment of collaboration and shared knowledge, contributing to the advancement of their respective fields.

Conclusion

James Patrick Doyle's contributions to the realm of microcircuit technology are invaluable. His patents encapsulate innovative approaches that address critical challenges in the industry, marking him as a significant figure in the technology landscape. As he continues his work at IBM, Doyle’s impact on the innovation front remains noteworthy and influential.

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