James Jeng-Jyi Hwang

This inventor holds 13 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2013-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: James Jeng-Jyi Hwang. Retrieved from https://idiyas.com/inventor/james-jeng-jyi-hwang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 13 (Patent Applications = 1)

% Patents Active = 92.3

Average Co-Inventor Count = 3.4

ph-index = 3

Forward Citations = 20(Granted Patents)

Location History:

Chu-Tong Township, TW (2018)
Chu-Tong Town, TW (2013 - 2019)
Hsin-Chu County, TW (2019 - 2024)

Company Filing History:

13 out of 42,872

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

Years Active: 2013-2024

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12066760 - Reticle-masking structure, extreme ultra violet apparatus, and method of forming the same (2024-08-20),

2. 11999027 - Method for polishing semiconductor substrate (2024-06-04),

3. 11772227 - Device and methods for chemical mechanical polishing (2023-10-03),

4. 11602821 - Wafer polishing head, system thereof, and method using the same (2023-03-14),

5. 11287745 - Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same (2022-03-29),

6. 10875148 - Apparatus and methods for chemical mechanical polishing (2020-12-29),

7. 10875143 - Apparatus and methods for chemical mechanical polishing (2020-12-29),

8. 10866519 - Reticle-masking structure, extreme ultraviolet apparatus, and method of forming the same (2020-12-15),

9. 10513006 - High throughput CMP platform (2019-12-24),

10. 10507498 - Apparatus for particle cleaning (2019-12-17),

11. 10065288 - Chemical mechanical polishing (CMP) platform for local profile control (2018-09-04),

12. 9403254 - Methods for real-time error detection in CMP processing (2016-08-02),

13. 8394156 - Ultra-pure air system for nano wafer environment (2013-03-12),

Title: James Jeng-Jyi Hwang: Innovator in Semiconductor Technology

Introduction

James Jeng-Jyi Hwang is a prominent inventor based in Hsin-Chu County, Taiwan, known for his significant contributions to semiconductor technology. With a total of 13 patents to his name, Hwang has made remarkable advancements in the field, particularly in reticle-masking structures and semiconductor substrate polishing methods.

Latest Patents

Hwang's latest patents include a reticle-masking structure designed for extreme ultraviolet apparatuses. This innovative structure features a magnetic substrate with a paramagnetic part that includes a variety of fractions arranged on protrusion structures. Additionally, he has developed a method for polishing semiconductor substrates, which involves the use of an abrasive slurry at varying temperatures to enhance the polishing process.

Career Highlights

Hwang is currently employed at Taiwan Semiconductor Manufacturing Company Limited (TSMC), where he applies his expertise in semiconductor manufacturing and innovation. His work has been instrumental in advancing the capabilities of TSMC, a leader in the semiconductor industry.

Collaborations

Throughout his career, Hwang has collaborated with notable colleagues, including Chi-Ming Yang and Jiann Lih Wu. These partnerships have fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

James Jeng-Jyi Hwang's contributions to the semiconductor industry through his patents and collaborative efforts

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

1 patent pending: