The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2020

Filed:

Jul. 24, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

James Jeng-Jyi Hwang, Hsin-Chu County, TW;

Jiann Lih Wu, Hsin-Chu, TW;

He Hui Peng, Changhua County, TW;

Chi-Ming Yang, Hsinchu, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/013 (2012.01); H01L 21/00 (2006.01); H01L 21/66 (2006.01); H01L 21/321 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
B24B 37/013 (2013.01); H01L 21/31053 (2013.01); H01L 21/3212 (2013.01); H01L 22/26 (2013.01);
Abstract

An apparatus for CMP includes a platen, a wafer carrier retaining a semiconductor wafer during a polishing operation, a dresser configured to recondition a polishing pad disposed on the platen during the polishing operation, and a vibration-monitoring system configured to detect vibrations during the polishing operation. The vibration-monitoring system includes a first vibration sensor configured to generate a plurality of first vibration signals. An end point is triggered to the polishing when a change between the plurality of vibration signals reaches a value.


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