The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2023

Filed:

Jan. 17, 2020
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

James Jeng-Jyi Hwang, Hsin-Chu County, TW;

He Hui Peng, Changhua County, TW;

Jiann Lih Wu, Hsin-Chu, TW;

Chi-Ming Yang, Hsinchu, TW;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 47/12 (2006.01); H01L 21/304 (2006.01); B24B 57/02 (2006.01); B24B 37/20 (2012.01);
U.S. Cl.
CPC ...
B24B 47/12 (2013.01); B24B 37/20 (2013.01); B24B 57/02 (2013.01); H01L 21/304 (2013.01);
Abstract

A wafer polishing head is provided. The wafer polishing head includes a carrier head, a plurality of piezoelectric actuators disposed on the carrier head, and a membrane disposed over the plurality of piezoelectric actuators. The plurality of piezoelectric actuators is configured to provide mechanical forces on the membrane and generate an electrical charge when receiving counterforces of the mechanical forces through the membrane. A wafer polishing system and a method for polishing a substrate using the same are also provided.


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