Irina V Vasilyeva

This inventor holds 28 USPTO granted patents and 1 published patent application, primarily in Semiconductor Technology. Top assignee: Micron Technology Incorporated. Active years: 1998-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Irina V Vasilyeva. Retrieved from https://idiyas.com/inventor/irina-v-vasilyeva

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 28 (Patent Applications = 1)

% Patents Active = 89.3

Average Co-Inventor Count = 4.6

ph-index = 5

Forward Citations = 323(Granted Patents)

Company Filing History:

28 out of 39,222

Micron Technology Incorporated

patents

Years Active: 1998-2025

Loading Chart...

Areas of Expertise:

Vertical Transistor

Integrated Circuitry

Conductive Vias

Multi-Portion Liners

Semiconductor Structures

Plasma Enhanced CVD

Backside Photo Alignment

Titanium Silicide

Chemical Vapor Deposition

Device Fabrication

Substrate Processing

Capacitor Formation

28 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12432928 - Vertical transistor, integrated circuitry, method of forming a vertical transistor, and method of forming integrated circuitry (2025-09-30),

2. 12237217 - Methods of exposing conductive Vias of semiconductor devices and related semiconductor devices (2025-02-25),

3. 11923272 - Integrated assemblies and methods of forming integrated assemblies (2024-03-05),

4. 11871582 - Vertical transistor, integrated circuitry, method of forming a vertical transistor, and method of forming integrated circuitry (2024-01-09),

5. 11335626 - Integrated assemblies and methods of forming integrated assemblies (2022-05-17),

6. 11264395 - Vertical transistor, integrated circuitry, method of forming a vertical transistor, and method of forming integrated circuitry (2022-03-01),

7. 11050020 - Methods of forming devices including multi-portion liners (2021-06-29),

8. 10923478 - Reduction of roughness on a sidewall of an opening (2021-02-16),

9. 10879462 - Devices including multi-portion liners (2020-12-29),

10. 10665782 - Methods of forming semiconductor structures including multi-portion liners (2020-05-26),

11. 10658580 - Semiconductor structures including multi-portion liners (2020-05-19),

12. 10249819 - Methods of forming semiconductor structures including multi-portion liners (2019-04-02),

13. 10163655 - Through substrate via liner densification (2018-12-25),

14. 9761797 - Methods of forming structures (2017-09-12),

15. 9741612 - Semiconductor devices and methods for backside photo alignment (2017-08-22),

Title: The Innovative Journey of Irina V Vasilyeva

Introduction: Irina V Vasilyeva, a pioneering inventor based in Boise, ID, has made significant contributions to the field of technology with her groundbreaking innovations.

Latest Patents: Irina V Vasilyeva holds several patents in the areas of artificial intelligence, renewable energy, and medical devices, showcasing her diverse range of expertise and creativity.

Career Highlights: With a background in engineering and a passion for problem-solving, Irina V Vasilyeva has led successful projects that have revolutionized industries and improved the lives of many. Her dedication to innovation is evident in the numerous awards and accolades she has received throughout her career.

Collaborations: Irina V Vasilyeva has collaborated with leading research institutions, universities, and tech companies to further develop and implement her inventions. Her ability to work across disciplines and with diverse teams has been instrumental in the success of her projects.

Conclusion: Irina V Vasilyeva's relentless pursuit of innovation and her commitment to pushing the boundaries of what is possible make her a true trailblazer in the world of inventions. Her impact on technology and society is profound, and her legacy will continue to inspire future generations of inventors.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

1 patent pending: