Hung-Hsu Chen

Title: Innovations in Semiconductor Manufacturing by Hung-Hsu Chen

Introduction: Hung-Hsu Chen, a prominent inventor residing in Tainan, Taiwan, has made significant contributions to the field of semiconductor manufacturing with an impressive portfolio of 24 patents. His work focuses on advancements in semiconductor devices, improving performance and efficiency.

Latest Patents: Among Hung-Hsu Chen's latest patents is a method for manufacturing semiconductor devices with multiple silicide regions. This innovation involves the deposition of a first and second silicide precursor on a source/drain region, leading to the formation of two distinct silicide phases that enhance device functionality. Another notable patent details a contact structure for semiconductor devices, which includes a fin structure, a gate stack, and an epitaxial source/drain region. This design incorporates a first silicide region of nickel silicide and a second silicide region of titanium silicide, optimizing the electrical characteristics of the device.

Career Highlights: Hung-Hsu Chen works for Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in materials and processes has solidified his reputation as a key innovator in his field, pushing the boundaries of semiconductor technology.

Collaborations: Throughout his career, Chen has collaborated with esteemed colleagues such as Wei-Yip Loh and Chih-Wei Chang. These partnerships have facilitated a dynamic exchange of ideas and fostered further innovation within the semiconductor manufacturing landscape.

Conclusion: With 24 patents to his name, Hung-Hsu Chen continues to drive innovation in semiconductor technology. His contributions not only enhance the capabilities of semiconductor devices but also play a crucial role in the advancement of electronic applications globally.