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San Jose, CA, United States of America

Huixiong Dai

USPTO Granted Patents = 44 (Patent Applications = 14)

Average Co-Inventor Count = 4.6

ph-index = 6

Forward Citations = 115(Granted Patents)

Location History:

Santa Clara, CA (US) (2023)
San Jose, CA (US) (2011 - 2024)

Company Filing History:

37 out of 13,713

Applied Materials, Inc.

Varian Semiconductor Equipment Associates, Inc.

Years Active: 2011-2025

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Areas of Expertise:

Semiconductor Manufacturing

Photoresist Patterning

Lithography Process

EUV Photoresist

Spin-Orbit Torque MRAM

Nanoscale Patterning

Physical Vapor Deposition

Overlay Error Correction

Self-Aligned Interconnects

Ion Implantation Techniques

Localized Stress Modulation

Multi-Patterning Applications

44 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12372874 - System architecture of manufacturing of semiconductor wafers (2025-07-29),

2. 12204246 - Metal oxide resist patterning with electrical field guided post-exposure bake (2025-01-21),

3. 12201030 - Spin-orbit torque MRAM structure and manufacture thereof (2025-01-14),

4. 12198985 - Contact over active gate structure (2025-01-14),

5. 12085858 - Photoresist patterning process (2024-09-10),

6. 11914299 - Lithography process window enhancement for photoresist patterning (2024-02-27),

7. 11908691 - Techniques to engineer nanoscale patterned features using ions (2024-02-20),

8. 11880137 - Film structure for electric field guided photoresist patterning process (2024-01-23),

9. 11723283 - Spin-orbit torque MRAM structure and manufacture thereof (2023-08-08),

10. 11650506 - Film structure for electric field guided photoresist patterning process (2023-05-16),

11. 11609505 - Apparatus and methods for verification and re-use of process fluids (2023-03-21),

12. 11488823 - Techniques to engineer nanoscale patterned features using ions (2022-11-01),

13. 11437284 - Contact over active gate structure (2022-09-06),

14. 11429026 - Lithography process window enhancement for photoresist patterning (2022-08-30),

15. 11313034 - Methods for depositing amorphous silicon layers or silicon oxycarbide layers via physical vapor deposition (2022-04-26),

Title: Huixiong Dai - Pioneering Inventor from San Jose

Introduction: Huixiong Dai is a distinguished inventor based in San Jose, CA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Huixiong Dai holds several patents in the areas of artificial intelligence, machine learning, and semiconductor technology, showcasing his continuous commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Huixiong Dai has worked with leading tech companies in Silicon Valley, playing a key role in developing cutting-edge technologies that have revolutionized various industries.

Collaborations: Throughout his career, Huixiong Dai has collaborated with top researchers, engineers, and innovators, both locally and internationally, to drive innovation and bring transformative ideas to life.

Conclusion: Huixiong Dai's passion for innovation, coupled with his technical expertise and collaborative spirit, solidify his position as a prominent figure in the world of technology and invention, inspiring the next generation of inventors to push the boundaries of what is possible.

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