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For the Inventor, By the Inventor

San Jose, CA, United States of America

Huixiong Dai

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This inventor holds 45 USPTO granted patents and 19 published patent applications, primarily in Semiconductor Manufacturing. Top assignees: Applied Materials, Inc., Varian Semiconductor Equipment Associates, Inc.. Active years: 2011-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Huixiong Dai. Retrieved from https://idiyas.com/inventor/huixiong-dai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 45 

% Patents Active = 82.2

Average Co-Inventor Count = 4.6

ph-index = 6

Forward Citations = 121(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2023)
  • San Jose, CA (US) (2011 - 2024)

Company Filing History:

goldMedal38 out of 14,482 
 
Applied Materials, Inc.
 patents
silverMedal7 out of 916 
 
Varian Semiconductor Equipment Associates, Inc.
 patents

Years Active: 2011-2026

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Areas of Expertise:
Semiconductor Wafers
Photoresist Patterning
MRAM Structure
EUV Photoresist
Layer Deposition
Ion Implantation
Nanoscale Features
Overlay Error Correction
Subtractive Techniques
Electrical Field
Lithography Process
Localized Stress Modulation
45 patents (USPTO):Explore Patents
1. 12645157 - Vacuum bake for EUV lithography (2026-06-02),
2. 12372874 - System architecture of manufacturing of semiconductor wafers (2025-07-29),
3. 12204246 - Metal oxide resist patterning with electrical field guided post-exposure bake (2025-01-21),
4. 12201030 - Spin-orbit torque MRAM structure and manufacture thereof (2025-01-14),
5. 12198985 - Contact over active gate structure (2025-01-14),
6. 12085858 - Photoresist patterning process (2024-09-10),
7. 11914299 - Lithography process window enhancement for photoresist patterning (2024-02-27),
8. 11908691 - Techniques to engineer nanoscale patterned features using ions (2024-02-20),
9. 11880137 - Film structure for electric field guided photoresist patterning process (2024-01-23),
10. 11723283 - Spin-orbit torque MRAM structure and manufacture thereof (2023-08-08),
11. 11650506 - Film structure for electric field guided photoresist patterning process (2023-05-16),
12. 11609505 - Apparatus and methods for verification and re-use of process fluids (2023-03-21),
13. 11488823 - Techniques to engineer nanoscale patterned features using ions (2022-11-01),
14. 11437284 - Contact over active gate structure (2022-09-06),
15. 11429026 - Lithography process window enhancement for photoresist patterning (2022-08-30),

Title: Huixiong Dai - Pioneering Inventor from San Jose

Introduction: Huixiong Dai is a distinguished inventor based in San Jose, CA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Huixiong Dai holds several patents in the areas of artificial intelligence, machine learning, and semiconductor technology, showcasing his continuous commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Huixiong Dai has worked with leading tech companies in Silicon Valley, playing a key role in developing cutting-edge technologies that have revolutionized various industries.

Collaborations: Throughout his career, Huixiong Dai has collaborated with top researchers, engineers, and innovators, both locally and internationally, to drive innovation and bring transformative ideas to life.

Conclusion: Huixiong Dai's passion for innovation, coupled with his technical expertise and collaborative spirit, solidify his position as a prominent figure in the world of technology and invention, inspiring the next generation of inventors to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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