The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2025
Filed:
Jun. 08, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Huixiong Dai, San Jose, CA (US);
Mangesh Ashok Bangar, San Jose, CA (US);
Srinivas D. Nemani, Sunnyvale, CA (US);
Steven Hiloong Welch, Milpitas, CA (US);
Ellie Y. Yieh, San Jose, CA (US);
Dmitry Lubomirsky, Cupertino, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method for processing a substrate is described. The method includes forming a metal containing resist layer onto a substrate, patterning the metal containing resist layer, and performing a post exposure bake on the metal containing resist layer. The post exposure bake on the metal containing resist layer is a field guided post exposure bake operation and includes the use of an electric field to guide the ions or charged species within the metal containing resist layer. The field guided post exposure bake operation may be paired with a post development field guided bake operation.