Hui-Jung Wu

Title: Innovations by Hui-Jung Wu: A Pioneer in Semiconductor Processing

Introduction

Hui-Jung Wu, based in Fremont, CA, is a distinguished inventor with an impressive portfolio of 40 patents. His work primarily focuses on innovations in semiconductor device manufacturing, particularly those that utilize tin oxide films and mandrels. Wu's contributions have significantly advanced techniques used in this critical field of technology.

Latest Patents

Wu's recent patents include innovative methods for using tin oxide mandrels in semiconductor device manufacturing. In one notable process, tin oxide layers are patterned using hydrogen-based and chlorine-based etch chemistries. This procedure creates a substrate with protruding tin oxide features. The next steps involve forming a conformal layer of spacer material, followed by selective removal that preserves the sidewalls of the mandrels. This technique demonstrates Wu's ability to refine patterning processes that are vital for producing sophisticated semiconductor devices.

Another significant patent focuses on the selective etching of tin oxide films on semiconductor substrates. This method showcases an etch selectivity of at least 10 when in the presence of silicon or carbon-containing materials. By employing a process gas that includes hydrogen and hydrocarbons, an innovative approach to forming a carbon-containing polymer is achieved. This invention not only enhances etching efficiency but also enables controlled patterning for advanced semiconductor applications.

Career Highlights

Throughout his career, Hui-Jung Wu has worked with notable organizations such as Lam Research Corporation and Honeywell International Inc. His tenure at these companies has involved pioneering roles in research and development, allowing him to explore the intricacies of semiconductor technology.

Collaborations

Wu has collaborated closely with talented peers, including James S. Drage and Teresa A. Ramos. This collaborative environment has fostered innovation and led to the development of groundbreaking technologies in semiconductor manufacturing.

Conclusion

Hui-Jung Wu's impressive contributions and patents in the field of semiconductor processing underscore his status as an influential inventor. With his ongoing commitment to innovation, Wu continues to shape the future of technology through his groundbreaking work in semiconductor device manufacturing. As the industry evolves, his expertise and ingenuity will undoubtedly lead to further advancements that will benefit the field for years to come.