Hsing-Chen Wu

Title: Inventor Hsing-Chen Wu: A Pioneer in Selective Etching Technologies

Introduction

Hsing-Chen Wu is an influential inventor based in Yonghe, Taiwan, known for his groundbreaking contributions to the field of selective etching technologies. With a total of nine patents to his name, Wu's work has significantly advanced the semiconductor manufacturing process. His innovations are crucial for enhancing the efficiency and effectiveness of various etching methods used in the industry.

Latest Patents

Wu's latest patents include notable technologies that improve the precision of etching processes. One of these patents focuses on **Selective etchant compositions and methods**, which describe compositions and methodologies for selectively etching silicon nitride in the presence of silicon oxide, polysilicon, and/or metal silicides. This invention emphasizes achieving a high etch rate coupled with exceptional selectivity, utilizing additives that maintain the desired performance across different silica loading windows.

Another significant patent by Wu is the **Method for removing hard masks**, which outlines compositions and procedures for effectively etching amorphous carbon hard masks doped with elements such as boron, chlorine, or nitrogen. The method employs concentrated sulfuric acid, water, and at least one oxidizing agent to selectively remove the doped hard mask layer while maintaining excellent selectivity even against layers like silicon dioxide and silicon nitride.

Career Highlights

Hsing-Chen Wu is employed at Entegris, Inc., a leading company in the field of materials and solutions for advanced manufacturing in the semiconductor industry. His innovative work has not only expanded the capabilities of etching technology but has also made significant contributions to the overall advancement of semiconductor fabrication processes.

Collaborations

Throughout his career, Wu has collaborated with several noteworthy professionals, including Emanuel Israel Cooper and Min-Chieh Yang. These collaborations have facilitated the exchange of ideas and further propelled advancements in etching technologies, showcasing the collective effort towards innovation in the high-tech field.

Conclusion

Hsing-Chen Wu stands out as a distinguished inventor whose contributions have profoundly impacted semiconductor manufacturing technologies. His expertise in developing selective etching compositions and methods continues to inspire innovation and efficiency in the industry. As the demand for higher precision and selectivity in manufacturing processes grows, Wu's inventions will undoubtedly play a pivotal role in shaping the future of semiconductor technology.