Changhua County, Taiwan

Hong-Hsien Ke

USPTO Granted Patents = 7 

Average Co-Inventor Count = 5.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2024

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7 patents (USPTO):

Title: Innovations of Hong-Hsien Ke in Semiconductor Technology

Introduction

Hong-Hsien Ke is a prominent inventor based in Changhua County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of seven patents. His work focuses on enhancing semiconductor structures and manufacturing processes, which are crucial for the advancement of electronic devices.

Latest Patents

One of his latest patents involves a semiconductor structure that includes a gate structure, a source/drain structure, a barrier layer, and a glue layer. The gate structure is positioned over a fin structure, while the source/drain structure is integrated within the fin structure and adjacent to the gate structure. The barrier layer is placed over the source/drain structure, and the glue layer is in direct contact with the gate structure, featuring an extending portion. Another notable patent describes a method of manufacturing a semiconductor device, where an etch stop layer is formed over a semiconductor fin and gate stack. This process utilizes a series of pulses of precursor materials, resulting in a thicker etch stop layer along the bottom surface compared to the sidewalls.

Career Highlights

Hong-Hsien Ke is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative work has contributed to the company's reputation for excellence in semiconductor manufacturing.

Collaborations

He has collaborated with notable coworkers, including Chia-Hui Lin and Shih-Wen Huang, who share his commitment to advancing semiconductor technology.

Conclusion

Hong-Hsien Ke's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced electronic devices.

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