Tochigi, Japan

Hitoshi Nakano

This inventor holds 23 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Lithography Technology. Top assignees: Canon Kabushiki Kaisha, Honda Giken Kogyo Kabushiki Kaisha. Active years: 1979-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hitoshi Nakano. Retrieved from https://idiyas.com/inventor/hitoshi-nakano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 39.1


Average Co-Inventor Count = 1.4

ph-index = 6

Forward Citations = 207(Granted Patents)


Location History:

  • Niiza, JP (1979)
  • Yokohama, JP (1990)
  • Kawasaki, JP (1992)
  • Tochigi-Ken, JP (2007)
  • Tochigi, JP (1987 - 2010)
  • Utsunomiya, JP (2003 - 2018)

Company Filing History:


Years Active: 1979-2018

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Areas of Expertise:
Lithography Apparatus
Exposure Technique
Imprint Method
Device Fabrication
Chemical Filter
Immersion Exposure
Pattern Determination
Load-Lock Chamber
Hydraulic Shock Absorber
Alignment Method
Article Manufacturing
Gas Substituting
23 patents (USPTO):Explore Patents

Title: Hitoshi Nakano: A Pioneer in Lithography Technology

Introduction

Hitoshi Nakano, based in Tochigi, Japan, is an accomplished inventor known for his groundbreaking contributions to lithography technology. With a remarkable portfolio of 23 patents, Nakano has established himself as a significant figure in the realm of innovations related to patterning and manufacturing methods using lithography.

Latest Patents

His recent patents encompass advanced technologies such as a lithography apparatus, lithography method, program, lithography system, and article manufacturing method. One notable patent describes a lithography apparatus outfitted with multiple processing units that can perform patterning on diverse substrates belonging to a lot. A sophisticated controller directs operations based on specific substrate information, allowing for simultaneous processing of multiple substrates using recipe information tailored to the lot. Another innovative patent involves a lithography apparatus comprising an original conveying path, a substrate conveying path, and multiple row-arranged patterning devices. This design enhances efficiency by coordinating the processing of substrates between the two rows of patterning devices.

Career Highlights

Throughout his illustrious career, Nakano has worked with prestigious companies such as Canon and Honda. At Canon, he focused on developing intricate lithography systems, contributing to advancements in imaging technology. His time at Honda further honed his expertise in manufacturing processes, emphasizing the importance of precision and innovation in the automotive sector.

Collaborations

Hitoshi Nakano has collaborated with esteemed colleagues like Kiyoshi Arakawa and Yoshikazu Miyajima. These partnerships have led to shared innovations, fostering an environment of creativity and collaboration in the field of lithography and manufacturing.

Conclusion

Hitoshi Nakano's work exemplifies the spirit of innovation and the drive for technological advancement in lithography. His impressive patent portfolio not only highlights his contributions to the industry but also serves as an inspiration for future inventors in pursuit of groundbreaking inventions. As technology continues to evolve, Nakano's legacy will undoubtedly influence the next generation of innovations in manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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