The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Nov. 01, 2004
Applicant:
Hitoshi Nakano, Tochigi, JP;
Inventor:
Hitoshi Nakano, Tochigi, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
An atmosphere control technique for an exposure apparatus. An exposure apparatus to which this technique is applied includes, for example, a chamber which contains a space through which exposure light passes, a circulation system which has a path and circulates an inert gas through the path and the chamber, at least one valve provided in the path, a supply system which has a supply port at one end of a zone of the path defined by the at least one valve and supplies an inert gas to the supply port, and an exhaust system which has an exhaust port at the other end of the zone and exhausts a gas from the exhaust port.