The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2009
Filed:
Oct. 31, 2007
Hitoshi Nakano, Tochigi, JP;
Hitoshi Nakano, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus which has a projection optical system and exposes a substrate to a pattern of an original via the projection optical system with a gap between the projection optical system and the substrate filled with liquid. The apparatus includes a supply nozzle having a supply port to supply the liquid to the gap through the supply port, the supply port arranged on a first opposite surface to an exposed surface of the substrate, a recovery nozzle having a recovery port to recover the liquid through the recovery port, arranged more distant than the supply port from a final surface of the projection optical system, the recovery port arranged so as to oppose the exposed surface of the substrate, and a stepped portion having a second opposite surface to the exposed surface of the substrate. A distance between the second opposite surface and the exposed surface of the substrate is different from a distance between the first opposite surface and the exposured surface of the substrate.