The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2009
Filed:
Jul. 31, 2008
Hitoshi Nakano, Tochigi, JP;
Hitoshi Nakano, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus which has a projection optical system and exposes a substrate to a pattern of an original through the projection optical system with a gap between the projection optical system and the substrate filled with a liquid. The apparatus includes (a) a stage configured to hold the substrate and to be moved, and (b) a nozzle structure arranged around the final surface of the projection optical system and having first and second surfaces opposite to a surface of the substrate held by the stage, the first surface being arranged inside the second surface and different from the second surface in a distance from the surface of the substrate. The nozzle structure includes (i) a supply port configured to supply a liquid to the gap, and (ii) a recovery port, arranged on the first surface and outside the supply port, and configured to recover a liquid from the gap.