The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2008
Filed:
Jun. 08, 2007
Hitoshi Nakano, Tochigi, JP;
Hitoshi Nakano, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus which exposes a substrate to a pattern of an original via a projection optical system, with a gap between the projection optical system and the substrate being filled with liquid. The apparatus includes a substrate stage, movable with respect to the projection optical system, which holds the substrate, a plate, movable with respect to the projection optical system, having a substantially flush surface with an exposed surface of the substrate held by the substrate stage, and an immersion unit configured to supply and to recover the liquid. Supply and recovery by the immersion unit are simultaneously executed while the plate opposes the projection optical system.