Yokohama, Japan

Hisashi Muraoka

This inventor holds 20 USPTO granted patents and 1 published patent application, primarily in Semiconductor Cleaning. Top assignees: Purex Co., Ltd., Kabushiki Kaisha Toshiba, Tokyo Shibaura Electric Co., Ltd.. Active years: 1978-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisashi Muraoka. Retrieved from https://idiyas.com/inventor/hisashi-muraoka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20 

% Patents Active = 90.0

Average Co-Inventor Count = 1.9

ph-index = 11

Forward Citations = 454(Granted Patents)


Location History:

  • Yokohama, JA (1978)
  • Kanagawa, JP (1994)
  • Yokohama, JP (1979 - 2005)

Company Filing History:


Years Active: 1978-2005

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Areas of Expertise:
Organic Contamination
Semiconductor Substrate
Surface Treatment
Silicon Wafer
Cleaning Method
Air Filter
Contamination Removal
Surface Defects
X-Ray Analysis
Semiconductor Device
Metallic Impurities
Cleaning Fluid
20 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Hisashi Muraoka

Introduction

Hisashi Muraoka, a prominent inventor based in Yokohama, Japan, has made significant contributions to the fields of electronics and materials science. With a remarkable portfolio of 20 patents, Muraoka is known for his innovative methods in preventing organic contamination in electronic device substrates and for the development of techniques to remove organic films from various surfaces.

Latest Patents

Hisashi Muraoka's latest patents showcase his expertise and ingenuity. One notable invention is the "Method of preventing organic contamination from the atmosphere of electronic device substrates and electronic device substrates treated therewith." This patent details a technique for treating electronic device substrates, such as semiconductor silicon wafers or liquid crystal glass substrates, with a choline-containing aqueous solution. This process significantly reduces organic contamination, achieving a surface carbon concentration of no more than approximately 3×10 atoms/cm, even under standard clean room conditions.

Another important patent from Muraoka focuses on the "Method and apparatus for removing organic films." This innovation involves using a treatment liquid containing dissolved ozone to effectively eliminate organic films, such as resist films, from substrate surfaces. The apparatus he designed for this process includes a treatment liquid delivery device, a film contact device, a liquid circulation device, and an ozone dissolution device, further enhancing the efficiency of film removal in various applications.

Career Highlights

Throughout his career, Hisashi Muraoka has worked with respected companies, including Purex Co., Ltd. and Kabushiki Kaisha Toshiba. His experiences in these organizations have undoubtedly influenced his inventive practices and helped shape his innovative mindset.

Collaborations

Muraoka has collaborated with notable individuals in the industry, including Masafumi Asano and Taizo Ohashi. These partnerships have contributed to the success and advancement of his research and inventions, fostering a spirit of teamwork and shared innovation.

Conclusion

Hisashi Muraoka's contributions as an inventor continue to make a lasting impact in the field of electronics. With his extensive patent portfolio and innovative methodologies, he exemplifies the spirit of invention that drives advancements in technology. Muraoka's work not only enhances the performance of electronic devices but also serves as a foundation for future research and developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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