The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 1997

Filed:

Aug. 30, 1996
Applicant:
Inventors:

Tuyoshi Matumura, Kawasaki, JP;

Kunihiro Miyazaki, Tokyo, JP;

Hisashi Muraoka, Yokohama, JP;

Assignees:

Kabushiki Kaisha Toshiba, Kawasaka, JP;

Purex Co., Ltd., Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
378 45 ; 378 79 ;
Abstract

An apparatus is disclosed which is used for total reflection fluorescent X-ray analysis on a liquid drop-like sample containing very small amounts of impurities. The apparatus comprises a heat-resistant thin sheet containing an element or elements, as a principal component, not detected on total reflection fluorescent X-ray analysis and an x-ray source directing an X-ray as an incident X-ray at a liquid drop-like sample put on the sheet and containing very small amounts of impurities whereby the liquid drop-like sample is evaporated to a dried solid for the total reflection fluorescent X-ray analysis to be performed there.


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Matumura, Tuyoshi. (1997). Apparatus used for total reflection fluorescent x-ray analysis on a (U.S. Patent No. 5636256). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5636256

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