The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 08, 2005

Filed:

Oct. 14, 2003
Applicants:

Hisashi Muraoka, Yokohama, JP;

Rieko Muraoka, Yokohama, JP;

Asuka Sato, Yokohama, JP;

Mitsuru Endo, Yokohama, JP;

Inventors:

Hisashi Muraoka, Yokohama, JP;

Rieko Muraoka, Yokohama, JP;

Asuka Sato, Yokohama, JP;

Mitsuru Endo, Yokohama, JP;

Assignees:

Nomura Micro Science Co., Ltd., Atsugi, JP;

UMS Co., Ltd., Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D005/00 ;
U.S. Cl.
CPC ...
Abstract

A method and an apparatus for removing an organic film, such as a resist film, from a substrate surface are provided wherein a treatment liquid containing dissolved ozone, and preferably formed from liquid ethylene or propylene carbonate, or both, is contacted with the substrate having the organic film, and the organic film removed, wherein the apparatus contains (A) a treatment liquid delivery device, (B) a film contact device, (C) a liquid circulation device and (D) an ozone dissolution device.


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Muraoka, Hisashi. (2005). Method and apparatus for removing organic films (U.S. Patent No. 6851873). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6851873

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