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Kanagawa, Japan

Nomura Micro Science Co., Ltd.

USPTO Granted Patents = 23

EPO Patents = 1

Trademarks = 1

Forward Citations = 326

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46 inventors (with patents filed for the assignee):

Takayuki Jizaimaru (6 out of 6 patents)

Mitsugu Abe (5 out of 5 patents)

Masamitsu Iiyama (3 out of 3 patents)

4. Hisashi Muraoka (3 out of 20 patents)

5. Yasuyuki Shirai (2 out of 37 patents)

6. David Hui Wang (2 out of 7 patents)

7. Takeshi Sakai (2 out of 4 patents)

8. Mutsuko Endou (2 out of 2 patents)

9. Takazou Hirose (2 out of 2 patents)

10. Tomoji Kawai (1 out of 40 patents)

11. Tooru Kusano (1 out of 1 patent)

12. Kazunari Akahira (1 out of 1 patent)

13. Takashi Ito (1 out of 2 patents)

14. Nobuyoshi Nambu (1 out of 13 patents)

15. Osamu Ito (1 out of 32 patents)

23 patents: Sort by Forward Citations

1. 12194414 - Liquid treatment apparatus, pure water production system, and liquid treatment method (2025-01-14),

2. D1049318 - Valve handle operation jig (2024-10-29),

3. 11926536 - Method for starting up hot ultrapure water production system, and hot ultrapure water production system (2024-03-12),

4. 11817309 - Method of producing heated ozone water, heated ozone water, and semiconductor wafer-cleaning liquid (2023-11-14),

5. 11295947 - Method for producing ozone water (2022-04-05),

6. 10865130 - Apparatus and method for producing alkaline water for cleaning electronic device (2020-12-15),

7. 10654014 - Functional water producing apparatus and functional water producing method (2020-05-19),

8. 10059911 - Washing hydrogen water producing method and producing apparatus (2018-08-28),

9. 8278219 - Method for purifying chemical added with chelating agent (2012-10-02),

10. 8202429 - Method for recovering a used slurry (2012-06-19),

11. 7805983 - Method for measuring the number of fine particles in ultrapure water and method for manufacturing a filtration device for measuring the number of fine particles in ultrapure water (2010-10-05),

12. 7625262 - Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurry (2009-12-01),

13. 7491302 - Electrolytic gas generation method and electrolytic gas generation device (2009-02-17),

14. 7043394 - Method and device for measuring fine particles in ultrapure water (2006-05-09),

15. 6896927 - Method of preventing organic contamination from the atmosphere of electronic device substrates and electronic device substrates treated therewith (2005-05-24),

NOMURA MICRO SCIENCE CO., LTD. is a leading manufacturer and supplier of advanced microscopy and imaging solutions. Since its establishment in 1971, the company has been dedicated to providing high-quality microscopes, cameras, software, and accessories to meet the diverse needs of research, industry, and education sectors. With a strong emphasis on innovation and technological advancements, NOMURA MICRO SCIENCE CO., LTD. continually develops cutting-edge products that enable scientists, engineers, and educators to explore the microscopic world in greater detail. For more information about their products and services, please visit their website.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 9 2025

23 Patents

#82 in Kanagawa

#2,644 in Japan

#26,790 in the World

Kanagawa, Japan

Nomura Micro Science Co., Ltd.

Forward Citations = 326

46 inventors:

Takayuki Jizaimaru (6 out of 6 patents)

Mitsugu Abe (5 out of 5 patents)

Masamitsu Iiyama (3 out of 3 patents)

4. Hisashi Muraoka (3 out of 20 patents)

5. Yasuyuki Shirai (2 out of 37 patents)

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