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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11817309 B1

PDFFull Text
Date of Patent:
Nov. 14, 2023

Filed:

Oct. 23, 2020

Method of producing heated ozone water, heated ozone water, and semiconductor wafer-cleaning liquid

Applicants:

Tohoku University, Sendai, JP;

Nomura Micro Science Co., Ltd., Atsugi, JP;

Inventors:

Yasuyuki Shirai, Sendai, JP;

Takeshi Sakai, Sendai, JP;

Takayuki Jizaimaru, Atsugi, JP;

Assignees:

TOHOKU UNIVERSITY, Sendai, JP;

NOMURA MICRO SCIENCE CO., LTD., Atsugi, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Gregory E Webb

Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/02 (2006.01); B08B 3/10 (2006.01); B08B 3/08 (2006.01); C02F 1/68 (2023.01); C11D 3/04 (2006.01); C11D 11/00 (2006.01); G03F 7/42 (2006.01); C11D 3/39 (2006.01); B01F 23/80 (2022.01); B01F 23/23 (2022.01); B01F 23/237 (2022.01); B01F 101/48 (2022.01); B01F 101/00 (2022.01);
U.S. Cl.
CPC ...
H01L 21/02057 (2013.01); B01F 23/2319 (2022.01); B01F 23/811 (2022.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); C02F 1/68 (2013.01); C11D 3/04 (2013.01); C11D 3/3947 (2013.01); C11D 11/0047 (2013.01); G03F 7/423 (2013.01); B01F 23/237613 (2022.01); B01F 2101/4505 (2022.01); B01F 2101/48 (2022.01); B01F 2215/044 (2013.01); B08B 2203/005 (2013.01); B08B 2203/007 (2013.01);
Abstract

Provided are: a method of producing heated ozone water, the method capable of producing heated ozone water having an extremely high ozone concentration by suppressing a reduction in the ozone concentration in high-concentration heated ozone water; heated ozone water; and a semiconductor wafer-cleaning liquid using the heated ozone water. A method of producing heated ozone water obtained by dissolving ozone in pure water, the method being characterized by including: adjusting a pH of the pure water to 3 or less by adding acid to the pure water; to obtain an acid water, dissolving an ozone gas in the acid water; and heating the pure water, the acid water or the ozone water, to 60° C. or more.

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