The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2004

Filed:

Oct. 02, 2000
Applicant:
Inventor:

Hisashi Muraoka, Yokohama, JP;

Assignee:

Nomura Micro Science Co., Ltd., Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23G 1/02 ;
U.S. Cl.
CPC ...
C23G 1/02 ;
Abstract

A method of removing surface-deposited contaminants, comprising bringing an ozone-containing treating solution into contact with the surface of a treating target on which contaminants have deposited. The ozone-containing treating solution comprises an organic solvent having a partition coefficient to ozone in a gas, of 0.6 or more, and ozone having been dissolved in the solvent. Contaminants having deposited on the surfaces of various articles including substrates for electronic devices, such as semiconductor substrates and substrates for liquid crystal display devices can be removed by room-temperature and short-time treatment in a high safety and a good efficiency.


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Muraoka, Hisashi. (2004). Method of removing contamination adhered to surfaces and apparatus used therefor (U.S. Patent No. 6699330). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6699330

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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