Mito, Japan

Hiroyuki Kobayashi

This inventor holds 57 USPTO granted patents and 1 published patent application and 4 EPO patents, primarily in Plasma Processing (CPC class 2503). Top assignees: Hitachi, Ltd., Hitachi-High-Technologies Corporation, Hitachi Construction Machinery Co., Ltd.. Active years: 1985-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Kobayashi. Retrieved from https://idiyas.com/inventor/hiroyuki-kobayashi-gservnao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 57 

% Patents Active = 61.4


Average Co-Inventor Count = 2.9

ph-index = 10

Forward Citations = 394(Granted Patents)

Forward Citations (Not Self Cited) = 371(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Katsuta, JP (1985)
  • Higashimurayama, JP (1998)
  • Mito, JP (1988 - 2015)
  • Hitachinaka, JP (2015)
  • Hitachi, JP (2015)
  • Kodaira, JP (2008 - 2016)

Company Filing History:


Years Active: 1985-2016

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Areas of Expertise:
Plasma Processing Apparatus
Electron Microscope
Transmission Electron Microscope
Plasma Sterilization
Vacuum Processing
Sample Observation
Charged Particle Beam
Image Reconstruction
Electrically Driven Vehicle
Specimen Observation Method
Plasma Processing Method
Bio Electron Microscope
57 patents (USPTO):Explore Patents

Title: Innovations by Hiroyuki Kobayashi: A Pioneer in Plasma and Vacuum Processing Technologies

Introduction

Hiroyuki Kobayashi, an esteemed inventor based in Mito, Japan, has made significant contributions to the field of plasma and vacuum processing technologies. With an impressive portfolio of 57 patents, Kobayashi has consistently pushed the boundaries of innovation, enhancing the capabilities of industrial applications.

Latest Patents

Two of Kobayashi's latest inventions include groundbreaking technologies poised to revolutionize their respective fields. The first patent, a **Plasma Processing Apparatus**, is designed to generate uniform plasma without incurring additional costs as the discharge area increases. This innovation incorporates a plurality of plasma discharge units, maintained by an RF power supply with an RF signal circuit and RF power circuit. The architecture enables the simultaneous processing of multiple plasma modules, significantly enhancing efficiency.

The second patent, a **Vacuum Processing Apparatus**, focuses on reducing foreign particle occurrences by improving maintenance ease. This apparatus features a dedicated gas diffuser chamber that accommodates the gas diffuser, emphasizing both functionality and user-friendly maintenance.

Career Highlights

Kobayashi's illustrious career includes tenures at leading corporations such as Hitachi, Ltd. and Hitachi High-Technologies Corporation. His work within these organizations has been pivotal in developing advanced technologies that cater to the growing demands of the semiconductor and materials processing industries.

Collaborations

Throughout his career, Kobayashi has collaborated with exceptional talents, including notable coworkers Masaru Izawa and Kenji Maeda. These partnerships have fostered an environment of innovation and experimentation, further propelling the advancements in plasma and vacuum technologies.

Conclusion

Hiroyuki Kobayashi stands out as a visionary inventor, whose 57 patents underscore his ongoing commitment to innovation. Through his latest advancements in plasma and vacuum processing technologies, he continues to make impactful contributions that benefit various industries, solidifying his legacy as a leader in technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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