The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2015
Filed:
Aug. 14, 2008
Applicants:
Hiroyuki Kobayashi, Kodaira, JP;
Masaru Izawa, Hino, JP;
Kenetsu Yokogawa, Tsurugashima, JP;
Kenji Maeda, Koganei, JP;
Inventors:
Hiroyuki Kobayashi, Kodaira, JP;
Masaru Izawa, Hino, JP;
Kenetsu Yokogawa, Tsurugashima, JP;
Kenji Maeda, Koganei, JP;
Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C23C 16/44 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4401 (2013.01); H01L 21/67201 (2013.01); H01L 21/67745 (2013.01);
Abstract
There is a vacuum processing apparatus which can reduce the amount of foreign particle occurrence by enhancing the ease of maintenance of a gas diffuser installing portion in the vacuum processing apparatus. A gas diffuser chamber for accommodating a gas diffuser is installed in the vacuum processing apparatus.