The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2014

Filed:

Apr. 06, 2012
Applicants:

Takumi Tandou, Hachioji, JP;

Nobuyuki Negishi, Tokyo, JP;

Hiroyuki Kobayashi, Kodaira, JP;

Keizo Suzuki, Kodaira, JP;

Inventors:

Takumi Tandou, Hachioji, JP;

Nobuyuki Negishi, Tokyo, JP;

Hiroyuki Kobayashi, Kodaira, JP;

Keizo Suzuki, Kodaira, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

In order to provide a plasma sterilization apparatus with high plasma generation efficiency, the apparatus includes first and second electrodes (), a first dielectric body layer (), and an insulating spacer (). The first dielectric body layer () is disposed between the first and second electrodes (). The insulating spacer () is disposed between the first electrode () and the first dielectric body layer (). The insulating spacer () has a lower permittivity than a permittivity of the first dielectric body layer ().


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