The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Mar. 14, 2013
Hiroyuki Kobayashi, Kodaira, JP;
Kenji Maeda, Kokubunji, JP;
Kenetsu Yokogawa, Tsurugashima, JP;
Masaru Izawa, Hino, JP;
Tadamitsu Kanekiyo, Kudamatsu, JP;
Hiroyuki Kobayashi, Kodaira, JP;
Kenji Maeda, Kokubunji, JP;
Kenetsu Yokogawa, Tsurugashima, JP;
Masaru Izawa, Hino, JP;
Tadamitsu Kanekiyo, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The object of the invention is to provide a plasma processing apparatus having enhanced plasma processing uniformity. The plasma processing apparatus comprises a processing chamber, meansandfor supplying processing gas into the processing chamber, evacuation meansandfor decompressing the processing chamber, an electrodeon which an objectto be processed such as a wafer is placed, and an electromagnetic radiation power supplyA, wherein at least two kinds of processing gases having different composition ratios of Oor Nare introduced into the processing chamber through different gas inlets so as to control the in-plane uniformity of the critical dimension while maintaining the in-plane uniformity of the process depth.