The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2013
Filed:
Apr. 26, 2012
Applicants:
Hiroyuki Kobayashi, Kodaira, JP;
Masaru Izawa, Hino, JP;
Inventors:
Hiroyuki Kobayashi, Kodaira, JP;
Masaru Izawa, Hino, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/00 (2006.01); B05C 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A diameter of a mounting unit of the stage of an ashing processing apparatus is less than a diameter of a mounting unit of the stage of an etching processing apparatus, and the diameter of the mounting unit of the stage of the etching processing apparatus is less than a diameter of an objective item.
Kobayashi, Hiroyuki. (2013). Plasma processing apparatus (U.S. Patent No. 8491751). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8491751
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile