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For the Inventor, By the Inventor

Fujisawa, Japan

Hiroyuki Kashiwagi

This inventor holds 12 USPTO granted patents and 1 published patent application. Top assignees: Kabushiki Kaisha Toshiba, Toshiba Memory Corporation, Shibaura Mechatronics Corporation. Active years: 2012-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Kashiwagi. Retrieved from https://idiyas.com/inventor/hiroyuki-kashiwagi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 12 

% Patents Active = 58.3

Average Co-Inventor Count = 4.3

ph-index = 3

Forward Citations = 14(Granted Patents)


Location History:

  • Kanagawa-ken, JP (2014)
  • Fujisawa, JP (2012 - 2018)
  • Kanagawa, JP (2018)
  • Minato-ku, JP (2020)

Company Filing History:

goldMedal7 out of 53,276 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal5 out of 2,955 
 
Toshiba Memory Corporation
 patents
bronzeMedal2 out of 180 
 
Shibaura Mechatronics Corporation
 patents
where one patent can have more than one assignee

Years Active: 2012-2020

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12 patents (USPTO):Explore Patents
1. 10773425 - Imprint template manufacturing apparatus and imprint template manufacturing method (2020-09-15),
2. 10668496 - Imprint template treatment apparatus (2020-06-02),
3. 10118317 - Template and pattern formation method (2018-11-06),
4. 10018908 - Pattern forming method (2018-07-10),
5. 9960007 - Electron beam irradiation device (2018-05-01),
6. 9588418 - Pattern forming method (2017-03-07),
7. 9550322 - Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method (2017-01-24),
8. 9029047 - Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method (2015-05-12),
9. 8945798 - Near-field exposure mask and pattern forming method (2015-02-03),
10. 8669522 - Mask inspection apparatus and mask inspection method (2014-03-11),
11. 8419950 - Pattern forming method (2013-04-16),
12. 8294889 - Method for inspecting nano-imprint template (2012-10-23),

Title: Hiroyuki Kashiwagi: Innovator in Imprint Template Manufacturing

Introduction

Hiroyuki Kashiwagi is a prominent inventor based in Fujisawa, Japan. He has made significant contributions to the field of imprint template manufacturing, holding a total of 12 patents. His innovative work focuses on enhancing the efficiency and effectiveness of imprint template production.

Latest Patents

Kashiwagi's latest patents include an imprint template manufacturing apparatus and an imprint template manufacturing method. The first patent describes an apparatus that features a supply head for applying a liquid-repellent material to a template with a concavo-convex pattern. This apparatus includes a moving mechanism for relative movement between the stage and the supply head, along with a controller to ensure precise application of the liquid-repellent material. The second patent outlines a treatment apparatus that supports a template and utilizes a similar mechanism for applying the liquid-repellent material while avoiding the concavo-convex pattern.

Career Highlights

Throughout his career, Hiroyuki Kashiwagi has worked with notable companies, including Toshiba Corporation and Toshiba Memory Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in imprint template manufacturing.

Collaborations

Kashiwagi has collaborated with talented individuals such as Naomi Shida and Kenji Todori. Their combined expertise has contributed to the advancement of technologies in their field.

Conclusion

Hiroyuki Kashiwagi's contributions to imprint template manufacturing demonstrate his commitment to innovation and excellence. His patents and collaborations reflect a dedication to advancing technology in this specialized area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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