Saitama, Japan

Hiromichi Kumakura

USPTO Granted Patents = 11 

Average Co-Inventor Count = 4.2

ph-index = 5

Forward Citations = 185(Granted Patents)


Location History:

  • Ooimachi, JP (2003 - 2004)
  • Sitama-ken, JP (2004)
  • Saitama, JP (2006 - 2019)
  • Niiza, JP (2015 - 2019)

Company Filing History:


Years Active: 2003-2019

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11 patents (USPTO):Explore Patents

Title: Hiromichi Kumakura: Innovator in Semiconductor Technology

Introduction

Hiromichi Kumakura is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 11 patents. His work focuses on improving the reliability and efficiency of semiconductor devices.

Latest Patents

Kumakura's latest patents include innovative designs for semiconductor devices and methods for their manufacturing. One notable patent describes a semiconductor device that incorporates a silicon carbide substrate with a protective film. This design helps to prevent moisture from affecting the side surfaces of the substrate, thereby enhancing the breakdown behavior and long-term reliability of the device. Another patent outlines a semiconductor device featuring two semiconductor regions with different conductivity types. This configuration allows for better management of charge carrier recombination, which effectively reduces the switching time of the device.

Career Highlights

Hiromichi Kumakura is currently employed at Sanken Electric Co., Ltd., where he continues to advance semiconductor technology. His expertise and innovative approach have positioned him as a key figure in the industry.

Collaborations

Kumakura has worked alongside talented colleagues such as Hiroko Kawaguchi and Hiroshi Shikauchi. Their collaborative efforts have contributed to the development of cutting-edge semiconductor solutions.

Conclusion

Hiromichi Kumakura's contributions to semiconductor technology are noteworthy, with a focus on enhancing device reliability and efficiency. His innovative patents and collaborative work continue to influence the field significantly.

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