Company Filing History:

12 out of 10,317

Tokyo Electron Limited

$V-tex Corporation$

where one patent can have more than one assignee

Years Active: 2000-2022

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11527426 - Substrate processing device (2022-12-13),

2. 10971385 - Substrate processing apparatus and transfer position correcting method (2021-04-06),

3. 9805962 - Substrate conveyance method, and substrate conveyance device (2017-10-31),

4. 8382938 - Gate valve cleaning method and substrate processing system (2013-02-26),

5. 8113757 - Intermediate transfer chamber, substrate processing system, and exhaust method for the intermediate transfer chamber (2012-02-14),

6. 8048235 - Gate valve cleaning method and substrate processing system (2011-11-01),

7. D556157 - Load-lock chamber (2007-11-27),

8. 7105847 - Semiconductor processing-purpose substrate detecting method and device, and substrate transfer system (2006-09-12),

9. D527751 - Transfer-chamber (2006-09-05),

10. 6932885 - Vacuum processing device (2005-08-23),

11. 6488262 - Gate valve for semiconductor processing system (2002-12-03),

12. 6092786 - Gate valve (2000-07-25),

Title: Hiroki Oka: Innovator in Substrate Processing Technology

Introduction

Hiroki Oka is a prominent inventor based in Nirasaki, Japan, known for his significant contributions to substrate processing technology. With a total of 12 patents to his name, Oka has made remarkable advancements in the field, particularly in devices that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

Oka's latest patents include a substrate processing device that features a transfer chamber designed to operate under atmospheric conditions while integrating multiple processing units. Each processing unit contains at least one processing chamber for vacuum processing and a load-lock chamber that facilitates the transition between atmospheric and vacuum environments. This innovative design allows for a seamless connection between the transfer chamber and the load-lock chamber, enhancing operational efficiency.

Another notable patent is the substrate processing apparatus, which incorporates a transfer device equipped with a first pick for holding substrates. This apparatus includes a detecting device to ascertain the substrate's position, a susceptor for substrate placement, and an elevating device for vertical movement. The control device within this apparatus features an adjuster for teaching processes and a corrector that adjusts the position of the first pick based on detected deviations, ensuring precise substrate handling.

Career Highlights

Throughout his career, Hiroki Oka has worked with esteemed companies such as Tokyo Electron Limited and V-Tex Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in substrate processing technology.

Collaborations

Oka has collaborated with notable colleagues, including Keisuke Kondoh and Tsuyoshi Moriya. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of innovative solutions in their field.

Conclusion

Hiroki Oka's contributions to substrate processing technology through his patents and collaborations highlight his role as a leading inventor in this domain. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology.

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