Tokyo, Japan

Hidehisa Nanai

USPTO Granted Patents = 19 

Average Co-Inventor Count = 5.6

ph-index = 4

Forward Citations = 53(Granted Patents)


Location History:

  • Kawagoe, JP (1995 - 1998)
  • Saitama, JP (2004)
  • Toshima-ku, JP (2014)
  • Tokyo, JP (2008 - 2019)

Company Filing History:


Years Active: 1995-2019

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19 patents (USPTO):Explore Patents

Title: Inventor Hidehisa Nanai - Innovator in Wafer Technology

Introduction

Hidehisa Nanai, an esteemed inventor based in Tokyo, Japan, has made significant contributions to the field of wafer technology. With a prolific collection of 19 patents to his name, Nanai has established himself as a pivotal figure in the development of innovative chemical solutions, particularly for enhancing the functionality and durability of wafers.

Latest Patents

Among his latest inventions is a liquid chemical designed for forming a water-repellent protecting film on a wafer. This innovative solution utilizes a water-insoluble surfactant as the water-repellent-protecting-film-forming agent. The application of this chemical is particularly beneficial during the cleaning process of wafers that feature finely uneven patterns on their surfaces. The method effectively prevents pattern collapse, ensuring the integrity and performance of the wafer is maintained. Additionally, another patent discloses a similar liquid chemical aimed at protecting the surface of recessed portions of uneven patterns containing silicon. This formulation includes various silicon compounds and acids, further advancing wafer cleaning technology.

Career Highlights

Throughout his career, Hidehisa Nanai has worked with notable companies such as Central Glass Company, Limited, and Central Grass Company, Limited. His tenure at these companies allowed him to harness his expertise in chemical formulations and wafer technologies, leading to the creation of numerous patents that contribute significantly to the industry.

Collaborations

In his quest for innovation, Nanai has collaborated with esteemed coworkers such as Soichi Kumon and Takashi Saio. Their combined efforts have fostered an environment of creativity and exploration in the field, resulting in groundbreaking advancements in wafer cleaning processes and protective film applications.

Conclusion

Hidehisa Nanai embodies the spirit of innovation in the realm of wafer technology. His extensive patent portfolio reflects a dedication to enhancing manufacturing processes and materials. As advancements in this industry continue to evolve, Nanai’s contributions will undoubtedly play a crucial role in shaping the future of semiconductor technology.

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