The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2017

Filed:

Nov. 25, 2015
Applicant:

Central Glass Company, Limited, Ube-shi, Yamaguchi, JP;

Inventors:

Soichi Kumon, Matsusaka, JP;

Takashi Saio, Suzuka, JP;

Shinobu Arata, Matsusaka, JP;

Masanori Saito, Matsusaka, JP;

Atsushi Ryokawa, Ube, JP;

Shuhei Yamada, Ube, JP;

Hidehisa Nanai, Tokyo, JP;

Yoshinori Akamatsu, Matsusaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C09K 3/18 (2006.01); B08B 3/08 (2006.01); B08B 3/10 (2006.01); C11D 1/82 (2006.01); C11D 3/16 (2006.01); C11D 11/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02057 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); C09K 3/18 (2013.01); H01L 21/02082 (2013.01); C11D 1/82 (2013.01); C11D 3/162 (2013.01); C11D 11/0047 (2013.01);
Abstract

Disclosed is a liquid chemical for forming a water-repellent protecting film at least on a surface of a recessed portion of an uneven pattern at the time of cleaning a wafer having a finely uneven pattern at its surface and containing silicon at at least a part of the uneven pattern. This liquid chemical contains a silicon compound A represented by the general formula: RSi(H)Xand an acid A, the acid A being at least one selected from the group consisting of trimethylsilyl trifluoroactate, trimethylsilyl trifluoromethanesulfonate, dimethylsilyl trifluoroactate, dimethylsilyl trifluoromethanesulfonate, butyldimethylsilyl trifluoroactate, butyldimethylsilyl trifluoromethanesulfonate, hexyldimethylsilyl trifluoroacetate, hexyldimethylsilyl trifluoromethanesulfonate, octyldimethylsilyl trifluoroactate, octyldimethylsilyl trifluoromethanesulfonate, decyldimethylsilyl trifluoroacetate and decyldimethylsilyl trifluoromethanesulfonate.


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