The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2015

Filed:

Jan. 11, 2012
Applicants:

Takashi Saio, Suzuka, JP;

Soichi Kumon, Matsusaka, JP;

Masanori Saito, Matsusaka, JP;

Shinobu Arata, Matsusaka, JP;

Hidehisa Nanai, Tokyo, JP;

Yoshinori Akamatsu, Matsusaka, JP;

Inventors:

Takashi Saio, Suzuka, JP;

Soichi Kumon, Matsusaka, JP;

Masanori Saito, Matsusaka, JP;

Shinobu Arata, Matsusaka, JP;

Hidehisa Nanai, Tokyo, JP;

Yoshinori Akamatsu, Matsusaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 3/18 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02068 (2013.01);
Abstract

Disclosed is a liquid chemical for forming a water-repellent protecting film. The liquid chemical contains an agent for forming a water-repellent protecting film, and a solvent. The agent is for provided to form a water-repellent protecting film on a wafer after a cleaning step for the wafer and before a drying step for the wafer, the wafer having at its surface an uneven pattern and containing at least one kind element of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water-repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized in that the agent for forming a water-repellent protecting film is a compound represented by the following general formula [1].


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