The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2016
Filed:
Oct. 26, 2010
Masanori Saito, Matsusaka, JP;
Shinobu Arata, Matsusaka, JP;
Takashi Saio, Suzuka, JP;
Soichi Kumon, Matsusaka, JP;
Hidehisa Nanai, Tokyo, JP;
Yoshinori Akamatsu, Matsusaka, JP;
Masanori Saito, Matsusaka, JP;
Shinobu Arata, Matsusaka, JP;
Takashi Saio, Suzuka, JP;
Soichi Kumon, Matsusaka, JP;
Hidehisa Nanai, Tokyo, JP;
Yoshinori Akamatsu, Matsusaka, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.