The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2015
Filed:
Sep. 15, 2010
Soichi Kumon, Matsusaka, JP;
Masanori Saito, Matsusaka, JP;
Takashi Saio, Suzuka, JP;
Hidehisa Nanai, Tokyo, JP;
Yoshinori Akamatsu, Matsusaka, JP;
Soichi Kumon, Matsusaka, JP;
Masanori Saito, Matsusaka, JP;
Takashi Saio, Suzuka, JP;
Hidehisa Nanai, Tokyo, JP;
Yoshinori Akamatsu, Matsusaka, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass % or more of the water-repellent compound relative to the total quantity of 100 mass % of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. A cleaning process wherein a pattern collapse is easily induced can be improved by using the cleaning agent.